RET General Data

BSMA Louvain
NIL
OBDUCAT NIL3: Nano-imprint lithography: nanomolding of polymer films down to 30 nm feature size
Nanoscale Control of Polymer Crystallization by Nanoimprint Lithography; Zhijun Hu, Gabriel Baralia, Vincent Bayot, Jean-Fran?ois Gohy, and Alain M. Jonas; Nano Letters 2005, 5, 1738-1743

RET Access Conditions

yes
yes
yes
Ask for conditions
only within the frame of common projects

RET Contacts

Alain Jonas
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Alain Jonas
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